Samsung joins ASML‑led consortium to develop next‑gen 12‑inch photomask technology

Samsung Electronics confirmed its participation in a consortium led by ASML to advance semiconductor manufacturing with a new 12‑inch photomask platform, replacing the long‑standing 6‑inch standard. The group also counts Intel and TSMC among its members and aims to reduce defect rates and production costs. Samsung’s chief executive Jun Young‑hyun said the AI era is reshaping the industry and that deeper cooperation with ASML will lay the groundwork for the next wave of AI and semiconductor innovation. The partnership is intended to meet the growing performance and efficiency requirements of advanced chips, especially those for artificial‑intelligence applications.